OAI Model 212型紫外光刻機
。輸出光譜范圍:Hg: G(436nm),H(405nm),I(365nm)和310nm,Hg-Xe: 260 nm和220 nm或LED:365 nm、395 nm和405 nm
。燈功率范圍從1000到5000 w
。選擇UVLED (365 nm和405 nm)光源
?；叽绶秶鷱?2“dia平方
。特殊12“x 12”和3毫米厚玻璃基板
?；Q拋擲和面具
?？諝廨S承真空吸盤(pán)
。接近(15-20umgap): & lt; 3.0 - 5.0,柔軟觸點(diǎn):2.0um，硬觸點(diǎn):1um和真空接點(diǎn):≤0.5um
。對齊模塊X, Y,和Z軸和θ
。雙通道光學(xué)反饋
。只提供正面接觸w / IR選項
。僅在桌面選項可用,適用于研發(fā)和獨立的工作
。占用空間小
。適用于生物學(xué)、微機電系統、半導體和Microfludics CLiPP應用程序
Model 212 Table Top Mask Aligner System
。 Output Spectra Range: Hg: G (436nm), H (405nm), I(365nm) ａnd 310nm lines, Hg-Xe: 260nm ａnd 220nm or LED: 365nm, 395nm ａnd 405nm
。 Lamp Power range from 1000 to 5000W
。 Option for UVLED (365nm ａnd 405nm) Light Source
。 Substrate sizes range from 12” dia to sq
。 Special 12” x 12” ａnd up to 3mm thick Glass Substrates
。 Interchangeable chucks ａnd mask holders
。 Air bearing vacuum chuck
。Proximity (15-20umgap ): <3.0 – 5.0um, Soft Contact: <2.0um, Hard contact: 1um and vacuum contact : ≤ 0.5um
。 Alignment module X, Y, ａnd Z axis ａnd theta
。 Dual-channel optical feedback
。 Provides Front side exposure only w/ IR Option
。 Available in Table top option only ａnd applicable for R&D ａnd standalone work
。 Small Footprint
。 Applicable for Biology, MEMS, Semiconductor ａnd Microfludics, CLiPP applications
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